Assessment of diffusional mobilities of Cr, Ni, and Si in fee Cr-Ni-Si alloys

Yong Du, Julius Schuster

Veröffentlichungen: Beitrag in FachzeitschriftArtikelPeer Reviewed

Abstract

The diffusional mobilities of Cr, Ni, and Si in fee Cr-Ni-Si alloys have been assessed as a function of temperature and composition by means of a CALPHAD (CALculation of PHAse Diagrams) type of procedure. Optimized kinetic parameters are presented. Comparisons between the calculated and measured diffusion coefficients show that most of the experimental information is satisfactorily accounted for by the present modeling. The obtained parameters can predict reasonably concentration profiles in binary Ni-Si and ternary Cr-Ni-Si diffusion couples.
OriginalspracheEnglisch
Seiten (von - bis)28-31
Seitenumfang4
FachzeitschriftInternational Journal of Materials Research
Jahrgang92
Ausgabenummer1
PublikationsstatusVeröffentlicht - 2001

ÖFOS 2012

  • 104017 Physikalische Chemie

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