Wave and Particle in Molecular Interference Lithography

Thomas Juffmann, Stefan Truppe, Philipp Geyer, András Major, Sarayut Deachapunya, Hendrik Ulbricht, Markus Arndt

Veröffentlichungen: Beitrag in FachzeitschriftArtikelPeer Reviewed

Abstract

The wave-particle duality of massive objects is a cornerstone of quantum physics and a key property of many modern tools such as electron microscopy, neutron diffraction or atom interferometry. Here we report on the first experimental demonstration of quantum interference lithography with complex molecules. Molecular matter-wave interference patterns are deposited onto a reconstructed Si(111) 7×7 surface and imaged using scanning tunneling microscopy. Thereby both the particle and the quantum wave character of the molecules can be visualized in one and the same image. This new approach to nanolithography therefore also represents a sensitive new detection scheme for quantum interference experiments.
OriginalspracheEnglisch
Aufsatznummer263601
Seitenumfang4
FachzeitschriftPhysical Review Letters
Jahrgang103
Ausgabenummer26
DOIs
PublikationsstatusVeröffentlicht - 2009

ÖFOS 2012

  • 103026 Quantenoptik

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