Influence of Gas Injection Location and Magnetic Perturbations on ICRF Antenna Performance in ASDEX Upgrade

V. Bobkov (Corresponding author), I. Stepanov, P. Jacquet, I. Monakhov, R. Bilato, L. Colas, A. Czarnecka, R. Dux, H. Faugel, A. Kallenbach, Hans Werner Müller, J. -M. Noterdaeme, S. Potzel, Th. Puetterich, W. Suttrop, ASDEX Upgrade Team

Publications: Contribution to bookContribution to proceedingsPeer Reviewed

Abstract

In ASDEX Upgrade H-modes with H 98≈0.95, similar effect of the ICRF antenna loading improvement by local gas injection was observed as previously in L-modes. The antenna loading resistance R a between and during ELMs can increase by more than 25% after a switch-over from a deuterium rate of 7.5·10 21 D/s injected from a toroidally remote location to the same amount of deuterium injected close to an antenna. However, in contrast to L-mode, this effect is small in H-mode when the valve downstream w.r.t. parallel plasma flows is used. In L-mode, a non-linearity of R a at P ICRP<30 kW is observed when using the gas valve integrated in antenna. Application of magnetic perturbations (MPs) in H-mode discharges leads to an increase of R a>30% with no effect of spectrum and phase of MPs on R a found so far. In the case ELMs are fully mitigated, the antenna loading is higher and steadier. In the case ELMs are not fully mitigated, the value of R a between ELMs is increased. Looking at the W source modification for the improved loading, the local gas injection is accompanied by decreased values of tungsten (W) influx Γ W from the limiters and its effective sputtering yield Y w, with the exception of the locations directly at the antenna gas valve. Application of MPs leads to increase of Γ W and Y w for some of the MP phases. With nitrogen seeding in the divertor, ICRF is routinely used to avoid impurity accumulation and that despite enhanced Γ W and Y W at the antenna limiters.

Original languageEnglish
Title of host publicationRadiofrequency Power in Plasmas - Proceedings of the 20th Topical Conference
EditorsAA Tuccillo, S Ceccuzzi
PublisherAmerican Institute of Physics
Pages271-274
Number of pages4
ISBN (Print)9780735412101
DOIs
Publication statusPublished - 2014
Externally publishedYes
Event20th Topical Conference on Radio Frequency Power in Plasmas - Sorrento, Italy
Duration: 25 Jun 201328 Jun 2013

Publication series

SeriesAIP Conference Proceedings
Volume1580
ISSN0094-243X

Conference

Conference20th Topical Conference on Radio Frequency Power in Plasmas
Country/TerritoryItaly
CitySorrento
Period25/06/1328/06/13

Austrian Fields of Science 2012

  • 103022 Plasma physics

Keywords

  • ASDEX Upgrade
  • ICRF
  • antenna
  • coupling
  • sputtering
  • SCRAPE-OFF LAYER

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