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Modeling and analysis of sulfur hexafluoride plasma etching for silicon microcavity resonators

  • Luiz Felipe Aguinsky (Corresponding author)
  • , Georg Wachter
  • , Paul Manstetten
  • , Francio Rodrigues
  • , Michael Trupke
  • , Ulrich Schmid
  • , Andreas Hössinger
  • , Josef Weinbub

Publications: Contribution to journal › Article › Peer Reviewed

Original languageEnglish
Article number125003
Number of pages9
JournalJournal of Micromechanics and Microengineering
Volume31
Issue number12
DOIs
Publication statusPublished - Dec 2021

Funding

The financial support by the Austrian Federal Ministry for Digital and Economic Affairs, the National Foundation for Research, Technology and Development and the Christian Doppler Research Association is gratefully acknowledged. The computational results presented have been achieved in part using the Vienna Scientific Cluster (VSC). M Trupke and G Wachter gratefully acknowledge support from the EU H2020 framework programme (QuanTELCO, 862721), the FWF (SiC-EiC, I 3167-N27), and the FFG (QSense4Power, 877615). The authors acknowledge TU Wien Bibliothek for financial support through its Open Access Funding Programme.

Austrian Fields of Science 2012

  • 103026 Quantum optics
  • 102009 Computer simulation

Keywords

  • plasma etching
  • topography simulations
  • microcavity resonators
  • level-set
  • ray-tracing
  • PROFILE EVOLUTION
  • FLUX CALCULATION
  • MONTE-CARLO
  • SIMULATION
  • FRAMEWORK
  • SI
  • SOFTWARE
  • RATES
  • LASER
  • Topography simulations
  • Level-set
  • Plasma etching
  • Ray-tracing
  • Microcavity resonators

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