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Pitting corrosion – Preferred chloride diffusion pathways in physical vapor deposited AlCrN coatings

  • O. E. Hudak
  • , A. Bahr
  • , P. Kutrowatz
  • , T. Wojcik
  • , F. Bohrn
  • , L. Solyom
  • , R. Schuster
  • , L. Shang
  • , O. Hunold
  • , P. Polcik
  • , M. Heller
  • , P. Felfer
  • , G. Ball
  • , H. Riedl

Publications: Contribution to journalArticlePeer Reviewed

Abstract

Pitting corrosion of sputtered and arc evaportaed fcc-AlCrN coated low-alloy steel substrates was studied in a 0.1 M NaCl solution, using a three-electrode-cell. Depending on the deposition technique, several diffusion mechanisms were identified by high-resolution techniques (i.e. APT, TOF-SIMS). For arc evaporated AlCrN, incoherently embedded macro-particles provided the majority of fast-track diffusion pathways and pit-initiation sites, while their pristine coating matrix proved protective against chloride inward diffusion. Contrarily, the more coarse-grained sputtered AlCrN morphology with a highly orientated crystal growth featured diffusion paths along column boundaries, where chloride permeated the coating structure and initiated pit formations at the coating-substrate interface.

Original languageEnglish
Article number110901
JournalCorrosion Science
Volume211
DOIs
Publication statusPublished - Feb 2023

Austrian Fields of Science 2012

  • 205019 Material sciences
  • 205017 Materials engineering

Keywords

  • APT
  • Chloride Diffusion
  • Pitting Corrosion
  • PVD Coatings
  • Tafel-Plots
  • TOF-SIMS

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