Self-limited growth of a thin oxide layer on Rh(111)

Johan Gustafson; Anders Mikkelsen; M Borg; Edvin Lundgren; Lukas Koehler; Georg Kresse; Michael A. Schmid; Peter Varga; J Yuhara; Xavier Torrelles; C Quiros; Jesper N. Andersen

doi:10.1103/PhysRevLett.92.126102

Self-limited growth of a thin oxide layer on Rh(111)

Johan Gustafson, Anders Mikkelsen, M Borg, Edvin Lundgren, Lukas Koehler, Georg Kresse, Michael A. Schmid, Peter Varga, J Yuhara, Xavier Torrelles, C Quiros, Jesper N. Andersen

Publications: Contribution to journal › Article › Peer Reviewed

Abstract

The oxidation of the Rh(111) surface was studied on the atomic scale using a multimethod approach. Oxidation starts at the steps, resulting in a trilayer O-Rh-O surface oxide which prevents further oxidation at intermediate pressures. The initial exposure of the Rh(111) substrates to oxygen does not reveal any peculiarities. A thick corundum like Rh2O3 bulk oxide is formed only at significantly higher pressures and temperatures.

Original language	English
Article number	126102
Number of pages	4
Journal	Physical Review Letters
Volume	92
Issue number	12
DOIs	https://doi.org/10.1103/PhysRevLett.92.126102
Publication status	Published - 2004

Austrian Fields of Science 2012

103009 Solid state physics
103015 Condensed matter
103025 Quantum mechanics
103036 Theoretical physics

Access to Document

10.1103/PhysRevLett.92.126102

Cite this

@article{f62951b90aff42dca3018651e58aa23a,

title = "Self-limited growth of a thin oxide layer on Rh(111)",

abstract = "The oxidation of the Rh(111) surface was studied on the atomic scale using a multimethod approach. Oxidation starts at the steps, resulting in a trilayer O-Rh-O surface oxide which prevents further oxidation at intermediate pressures. The initial exposure of the Rh(111) substrates to oxygen does not reveal any peculiarities. A thick corundum like Rh2O3 bulk oxide is formed only at significantly higher pressures and temperatures.",

author = "Johan Gustafson and Anders Mikkelsen and M Borg and Edvin Lundgren and Lukas Koehler and Georg Kresse and Schmid, {Michael A.} and Peter Varga and J Yuhara and Xavier Torrelles and C Quiros and Andersen, {Jesper N.}",

note = "Coden: PRLTA Affiliations: Dept. of Synchrt. Radiation Research, Lund University, Box 118, S-221 00, Sweden; Institut f{\"u}r Materialphysik, Ctr. for Comput. Materials Science, Universit{\"a}t Wien, A-1090 Wien, Austria; Institut f{\"u}r Allgemeine Physik, Technische Universit{\"a}t Wien, A-1040 Wien, Austria; Dept. of Phys. Sci. and Engineering, Nagoya University, Nagoya, 464-8603, Japan; Inst. de Cie. de Mat. de Barcelona, 08193, Bellaterra, Barcelona, Spain; Europ. Synchrt. Radiation Facility, BP 220, 38043 Grenoble Cedex, France; Dept. F{\'i}sica, Universidad de Oviedo, Avda. Calvo Sotelo s/n, 33007 Oviedo, Spain Adressen: Gustafson, J.; Dept. of Synchrt. Radiation Research; Lund University; Box 118 S-221 00 Lund, Sweden; email: [email protected] Import aus Scopus: 2-s2.0-2342646704 22.10.2007: Datenanforderung 1935 (Import Sachbearbeiter) 22.10.2007: Datenanforderung 1936 (Import Sachbearbeiter)",

year = "2004",

doi = "10.1103/PhysRevLett.92.126102",

language = "English",

volume = "92",

journal = "Physical Review Letters",

issn = "0031-9007",

publisher = "AMER PHYSICAL SOC",

number = "12",

}

TY - JOUR

T1 - Self-limited growth of a thin oxide layer on Rh(111)

AU - Gustafson, Johan

AU - Mikkelsen, Anders

AU - Borg, M

AU - Lundgren, Edvin

AU - Koehler, Lukas

AU - Kresse, Georg

AU - Schmid, Michael A.

AU - Varga, Peter

AU - Yuhara, J

AU - Torrelles, Xavier

AU - Quiros, C

AU - Andersen, Jesper N.

N1 - Coden: PRLTA Affiliations: Dept. of Synchrt. Radiation Research, Lund University, Box 118, S-221 00, Sweden; Institut für Materialphysik, Ctr. for Comput. Materials Science, Universität Wien, A-1090 Wien, Austria; Institut für Allgemeine Physik, Technische Universität Wien, A-1040 Wien, Austria; Dept. of Phys. Sci. and Engineering, Nagoya University, Nagoya, 464-8603, Japan; Inst. de Cie. de Mat. de Barcelona, 08193, Bellaterra, Barcelona, Spain; Europ. Synchrt. Radiation Facility, BP 220, 38043 Grenoble Cedex, France; Dept. Física, Universidad de Oviedo, Avda. Calvo Sotelo s/n, 33007 Oviedo, Spain Adressen: Gustafson, J.; Dept. of Synchrt. Radiation Research; Lund University; Box 118 S-221 00 Lund, Sweden; email: [email protected] Import aus Scopus: 2-s2.0-2342646704 22.10.2007: Datenanforderung 1935 (Import Sachbearbeiter) 22.10.2007: Datenanforderung 1936 (Import Sachbearbeiter)

PY - 2004

Y1 - 2004

N2 - The oxidation of the Rh(111) surface was studied on the atomic scale using a multimethod approach. Oxidation starts at the steps, resulting in a trilayer O-Rh-O surface oxide which prevents further oxidation at intermediate pressures. The initial exposure of the Rh(111) substrates to oxygen does not reveal any peculiarities. A thick corundum like Rh2O3 bulk oxide is formed only at significantly higher pressures and temperatures.

AB - The oxidation of the Rh(111) surface was studied on the atomic scale using a multimethod approach. Oxidation starts at the steps, resulting in a trilayer O-Rh-O surface oxide which prevents further oxidation at intermediate pressures. The initial exposure of the Rh(111) substrates to oxygen does not reveal any peculiarities. A thick corundum like Rh2O3 bulk oxide is formed only at significantly higher pressures and temperatures.

U2 - 10.1103/PhysRevLett.92.126102

DO - 10.1103/PhysRevLett.92.126102

M3 - Article

SN - 0031-9007

VL - 92

JO - Physical Review Letters

JF - Physical Review Letters

IS - 12

M1 - 126102

ER -

Self-limited growth of a thin oxide layer on Rh(111)

Abstract

Austrian Fields of Science 2012

Access to Document

Fingerprint

Cite this