Study of Photovoltage Decays in Nanostructured Ge/Si

O. Korotchenkov, A. Nadtochiy, V. Schlosser

Publications: Contribution to bookContribution to proceedingsPeer Reviewed

Abstract

Motivated by the importance of the oxidized silicon layers, we have studied the surface photovoltage (SPV) transients in nanoislands of GexSi1x on silicon and oxidized Si surfaces. It is shown that the SPV decays can be approximated by the stretched-exponential form, with the β values ranging from 0.3 to 0.6 for the islands grown on oxide-covered Si substrates and from 0.5 to 1 for the ones placed on bare Si. On this basis, a simple qualitative model is proposed that takes into account a donor-and acceptor-like interface states at the GeSi/SiO2 and Si/SiO2 interface, which act as recombination centers with densities dependent on the GeSi coverage. These results can be used to improve the functionality of photoelectric devices based on Ge/Si.
Original languageEnglish
Title of host publicationGettering and Defect Engineering in Semiconductor Technology XV
EditorsJD Murphy
PublisherTRANS TECH PUBLICATIONS LTD
Pages406-411
Number of pages6
ISBN (Print)9783037858240
DOIs
Publication statusPublished - 2014
Event15th International Conference on Gettering and Defect Engineering in Semiconductor Technology (GADEST) - Oxford, United Kingdom
Duration: 22 Sep 201327 Sep 2013

Publication series

SeriesSolid State Phenomena (Diffusion and defect data B)
Volume205-206
ISSN1012-0394

Conference

Conference15th International Conference on Gettering and Defect Engineering in Semiconductor Technology (GADEST)
Abbreviated titleGADEST 2013
Country/TerritoryUnited Kingdom
CityOxford
Period22/09/1327/09/13

Austrian Fields of Science 2012

  • 103020 Surface physics
  • 103018 Materials physics
  • 103009 Solid state physics

Keywords

  • silicon-germanium
  • surface photovoltage
  • decay transients
  • ISLANDS
  • STRAIN
  • Silicon-germanium
  • Decay transients
  • Surface photovoltage

Cite this